Designation for the conflict minerals tantalum, tin, tungsten, and gold. Conflict minerals were regulated by U.S. Federal law in 2010 to avoid providing funding to organizations involved in violent conflict in the Democratic Republic of Congo (DRC).
Atomic layer deposition (ALD)
A technique for laying thin films using two alternating gaseous reactants (or “precursors”) which are released onto and chemically react with the surface of the target object. Alternate precursor applications are separated by inert gas purging which avoids interactions between the precursors in the gas phase. With this variant of chemical vapor deposition (CVD), coatings can be built up layer by layer with stringent control over thickness and composition on both 2D and 3D structures.